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      • Nano Fabrication
      • Material Characterization
      • Semiconductor IC Testing
      • Materials Testing Lab
      • Electronics Testing Lab
      • Nano Bio Tech
      • Electron Microscopy Lab
      • X Ray Inspection Facility
      • Polymer Rubber Test Lab
      • In Vitro Study
      • Mechanical Testing Lab
      • Consumer Testing Lab
    • Contact Us
    • IC Failure Analysis Lab
    • About Us
      • Our Mission
      • Jobs
    • Blog
  • Home
  • Services
    • Nano Fabrication
    • Material Characterization
    • Semiconductor IC Testing
    • Materials Testing Lab
    • Electronics Testing Lab
    • Nano Bio Tech
    • Electron Microscopy Lab
    • X Ray Inspection Facility
    • Polymer Rubber Test Lab
    • In Vitro Study
    • Mechanical Testing Lab
    • Consumer Testing Lab
  • Contact Us
  • IC Failure Analysis Lab
  • About Us
    • Our Mission
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Electron Microscopy Lab for SEM TEM FIB IMAGING and ANALYSIS

Scanning Electron Microscope  Analysis lab
Electron Microscopy Lab Imaging Analysis Facility

Electron Microscopy Lab : Seeing is Believing

Electron microscopy lab Bangalore for material testing analysis lab located in Bangalore for SEM TEM FIB AFM and Elemental Analysis, Cross section inspection. Dive into the microscopic world with our Electron Microscopy services for surface topography to elemental composition.

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Scanning Electron Microscope SEM applications

SEM for Nanomaterials

  • Morphological analysis using Scanning Electron Microscopy SEM for high resolution images of nanomaterials to study share, size and structures of Nanowires, Nanoparticles and more. 
  • Particle size analysis and distribution of nanoparticles within the samples. Blog on particle size analysis. 

SEM-EDS roles in Elemental Composition Analysis

  • Failure Analysis in Manufacturing: Scanning Electron Microscopy SEM combined with Energy-Dispersive X-ray Spectroscopy (EDS) is used to analyze the elemental composition of materials at failure sites. Identifying the presence of unexpected elements or impurities can help determine the root cause of material failures, such as corrosion, contamination, or incorrect material use.
  • Quality Control in Alloy Production: SEM-EDS is employed to verify the elemental composition of alloys during production. Ensuring that the correct proportions of elements are present is crucial for maintaining the desired mechanical and chemical properties of the final product.
  • Contamination Detection: SEM-EDS can detect trace levels of contaminants in materials. This is particularly important in industries like semiconductor manufacturing, where even minute impurities can significantly affect product performance and reliability.

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SEM for Microelectronic device application

SEM is extensively used in testing analysis lab to detect and analyze defects in microelectronic devices, such as integrated circuits (ICs) and semiconductor wafers. By providing high-resolution images of device surfaces and cross-sections. SEM can identify issues such as voids, cracks, delamination, and contaminations, which are crucial for understanding failure mechanisms and improving manufacturing processes. 

SEM in Failure analysis testing studies

 

  • Fractography: SEM is used in testing analysis lab to examine the fracture surfaces of failed components at high magnification. This analysis helps identify the mode of failure, such as brittle fracture, ductile fracture, fatigue, or stress corrosion cracking. Understanding the fracture characteristics is crucial for determining the root cause of failure and preventing future occurrences.
  • Corrosion Analysis: Scanning Electron Microscopy SEM enables detailed examination of corroded surfaces and interfaces. By analyzing the morphology and elemental composition of corrosion products, it is possible to identify the type and extent of corrosion, such as pitting, intergranular, or crevice corrosion. This information is vital for improving material selection and protective coatings.
  • Wear and Erosion Studies: SEM is used to analyze wear patterns and erosion damage on material surfaces. High-resolution imaging can reveal the mechanisms of wear, such as abrasion, adhesion, or surface fatigue. This helps in optimizing material properties and surface treatments to enhance wear resistance.
  • Delamination and Debonding Investigation: SEM is employed to study delamination and debonding in composite materials and coatings. Detailed imaging of the failure interfaces can provide insights into the adhesion quality, the presence of voids, and other factors contributing to the failure. This application is essential for improving manufacturing processes and material performance.

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SEM for Cross Section Analysis

Scanning Electron Microscopy SEM methods for cross-sectional analysis is used in testing analysis lab to investigate the layer structure and interfaces within multilayered materials and devices, such as microelectronics, coatings, and thin films. This application allows for the detailed visualization of each layer's thickness, uniformity, and adhesion, as well as the identification of any defects or discontinuities at the interfaces. Identifying these aspects is crucial to enhancing material performance and ensuring the reliability of electronic devices, coating layers.  

SEM for Biological and Dental materials

  • Microstructural Analysis of Dental Enamel and Dentin: Electron microscopy instruments such as SEM is used to study the microstructure of dental enamel and dentin, providing detailed images of their surface morphology and internal structures. This application helps in understanding the composition, wear patterns, and potential decay mechanisms, leading to improved dental treatments and materials.
  • Characterization of Biomaterials and Implants: SEM is employed by testing analysis labs to analyze the surface characteristics and composition of biomaterials used in dental implants, such as titanium and ceramic implants. This application ensures that the materials have the desired properties for biocompatibility, durability, and integration with the surrounding bone and tissue.
  • Evaluation of Dental Restoratives and Fillings: SEM provides high-resolution images of dental restorative materials and fillings, allowing for the assessment of their surface texture, adhesion quality, and potential failure points. This application is crucial for developing and improving materials like composites, amalgams, and sealants used in restorative dentistry.
  • Study of Biofilm Formation and Bacterial Interaction: SEM is used to examine the formation of biofilms on dental materials and biological tissues. This application helps in understanding how bacteria adhere, colonize, and interact with surfaces, leading to the development of better antimicrobial treatments and strategies for preventing dental infections.

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Transmission Electron Microscopy Lab and Imaging Facility

Transmission Electron Microscopy TEM : Digging Deep

From crystallography to nanomaterial analysis, our advanced Transmission Electron Microscopy (TEM) services are designed to reveal the intricate structures and compositions of your material insights you need to push the boundaries.

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TRANSMISSION ELECTRON MICROSCOPE TEM applications

TEM Nanostructure and Crystallography Analysis

Transmission Electron Microscopy (TEM) is an atomic-level structural analysis of nanomaterials, providing unmatched resolution and detail. This application employs TEM to investigate the crystallographic structure, lattice defects, and grain boundaries of nanoparticles, nanowires, and thin films. By obtaining high-resolution images and diffraction patterns, you can determine the precise composition of atoms, identify crystalline phases, and analyze defects within nanostructures. This information is crucial for testing analysis labs for understanding the material properties and behavior, guiding the development of advanced nanomaterials with tailored features for electronics, catalysis, energy storage, and other high-tech applications.  

TEM for Composition & Elemental mapping

  • Nanomaterials Characterization:Transmission Electron Microscopy (TEM) equipped with Energy Dispersive X-ray Spectroscopy (EDS) or Electron Energy Loss Spectroscopy (EELS) is used to determine the chemical composition and elemental distribution within nanomaterials. This application is crucial for developing and optimizing nanoparticles, nanowires, and other nanostructures for use in electronics, catalysis, and drug delivery systems.
  • Semiconductor Device Analysis:TEM-EDS and TEM-EELS are employed in testing analysis labs to analyze the elemental composition and distribution within semiconductor devices. This is essential for ensuring the quality and performance of components such as transistors, diodes, and integrated circuits, where precise doping and material interfaces are critical.
  • Battery Materials Research:TEM is used to investigate the chemical composition and elemental distribution in battery materials, including electrodes and electrolytes. This application helps in understanding the degradation mechanisms, improving material formulations, and enhancing the overall performance and lifespan of batteries.
  • Metal Alloys and Composites: SEM TEM FIB AFM provides detailed elemental mapping of metal alloys and composite materials, helping to identify the distribution of different elements and phases. This information is vital for optimizing the mechanical properties, corrosion resistance, and thermal stability of these materials in aerospace, automotive, and structural applications.

TEM SAED in Defect and Failure Analysis

Transmission Electron Microscopy TEM with SAED is an essential tool for identifying and analyzing crystal defects and phases within materials. This application involves using TEM to image a material's microstructure at high resolution, while SAED provides detailed diffraction patterns to determine the crystalline structure and orientation of specific regions. By examining areas with defects, such as dislocations, vacancies, and grain boundaries, researchers can uncover the causes of material failure and degradation. This information is essential for testing analysis labs for improving material design and processing methods, thus enhancing the reliability and performance of products in industries such as electronics, aerospace, and manufacturing.  

Focused Ion Beam Microscopy and Imaging Facility Services

Focused Ion Beam Microscopy FIB

Discover the precision power with our Focused Ion Beam (FIB) electron microscopy services in enabling detailed imaging, sample preparation, cross-sectioning microelectronics testing analysis lab services. 

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FOCUSED ION BEAM MICROSCOPY FIB applications

FIB for Material Science Research

FIB electron microscopy is employed to study the microstructure and composition of materials. It allows testing analysis lab researchers to create detailed cross-sections and perform site-specific material removal, enabling the analysis of internal features, grain boundaries, and phase interfaces in metals, ceramics, polymers, and composites. 

FIB in Failure Analysis for Microelectronics

FIB electron microscopy and tools like SEM TEM FIB AFM are crucial tools for failure analysis in microelectronic devices. It allows for the precise cross-sectioning of integrated circuits and semiconductor components to identify defects, such as voids, cracks, and delaminations. This helps in diagnosing the root causes of device failures and improving manufacturing processes. 

FIB-TEM Applications

  • Site-Specific TEM Lamella Preparation: FIB electron microscopy is widely used to prepare ultra-thin lamellae from specific regions of a sample for TEM analysis. This application employs the FIB to precisely mill and extract a thin piece of material from a targeted area, such as a defect site, interface, or region of interest in complex devices. The TEM lamella is then thinned to electron transparency, enabling high-resolution TEM imaging and analysis of microstructural and compositional features at the nanoscale. This precise sample preparation technique is essential for studying localized phenomena in materials science, semiconductor devices, and nanotechnology. 
  • Cross-Sectional TEM Sample Preparation: FIB is also employed by testing analysis lab to create cross-sectional TEM samples, allowing for the examination of internal structures and interfaces within multilayered materials and devices. By cutting and thinning a cross-section of the sample, FIB facilitates the preparation of TEM specimens that reveal the detailed layer structure, thickness, and interface quality of complex materials. This application is indispensable for analyzing the performance and reliability of coatings, thin films, and electronic components, providing insights into material behavior and guiding improvements in manufacturing processes. 

Material Characterization Service Facility

Tool Lists
Atomic Force Microscopy Lab and Imaging Facility

atomic force microscopy AFM

Our Atomic Force Microscopy (AFM) and other electron microscopy capabilities deliver precise and reliable results to drive your innovation forward by unlocking the secrets of the nanoscale with our testing analysis lab team's unparalleled insights into the surface and electrical properties of your materials.  

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Atomic Force Microscopy MICROSCOPY AFM applications

AFM for Surface Roughness and Topography Analysis

AFM is a powerful electron microscopy technique for high-resolution surface profiling, providing detailed quantitative measurements of surface roughness and topography. AFM generates precise 3D images and roughness parameters, enabling the assessment of surface quality, texture, and uniformity. This information is crucial for quality control and optimization in various industries, such as semiconductor manufacturing, coatings, and biomedical implants, where surface properties contribute significantly to performance and functionality.  

AFM for Magnetic Property Characterization

AFM can be equipped with specialized probes to measure electrical and magnetic properties of materials at the nanoscale. This application includes techniques like conductive AFM (C-AFM) and magnetic force microscopy (MFM), which are used by testing analysis labs to study semiconductor devices, magnetic storage media, and nanostructured materials, providing insights into their functional properties and performance. 

AFM for Electrical Characterization

EFM electron microscopy is used to map the surface potential and charge distribution on a material. This technique helps in studying the electrical properties of insulating and semiconducting materials, including the detection of charge trapping sites, which is important for the development of electronic and optoelectronic devices.

Confocal Laser Scan Microscopy Lab and Imaging Facility

Confocal Laser Scanning Microscopy CLSM

Illuminate the unseen with our Confocal Laser Scanning Microscopy (CLSM) and Electron microscopy services located in Bangalore, delivering high-resolution, 3D images that reveal the intricate details of your nano materials, biological and dentin material testing analysis lab services to elevate your research.   

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CONFOCAL LASER SCAN MICROSCOPY CLSM applications

CLSM for Biological Tissue Imaging

CLSM is a valuable tool testing analysis lab for obtaining high-resolution, three-dimensional images of biological tissues. This application utilizes CLSM and electron microscopy to visualize and analyze cellular structures, subcellular components, and complex tissue structures with exceptional clarity. By using fluorescent labels, CLSM can highlight specific proteins, organelles, and other biological molecules in the tissue, allowing researchers to study cell functions, interactions, and dynamics in their native context. This capability is essential for advancing our understanding of various biological processes and diseases, assisting in biomedical research, drug development, and clinical diagnosis. 

CLSM for In Vitro Dental Material Study

  • Visualization of Microleakage Pathways in Dental Restorations: CLSM is utilized in testing analysis lab to visualize microleakage pathways at the interface between dental restorative materials and dentin. By utilizing fluorescent dyes that can penetrate micro gaps and cracks, CLSM provides high-resolution, three-dimensional images that reveal the presence and distribution of microleakage. This application enables researchers to evaluate the sealing ability of various dental materials, such as adhesives, composites, and sealants, under different conditions, resulting in the development of more effective and durable restorative solutions. 
  • Quantitative Measurement of Microleakage Extent: In addition to visualizing micro leaks, CLSM and SEM TEM FIB AFM allows quantitative measurement of the extent of microleakage in dentin-restorative interfaces. By analyzing the depth and volume of dye penetration in cross-sectional images, researchers can accurately determine the degree of microleakage. This application is crucial for comparing the performance of different dental materials and bonding techniques, optimizing formulations, and enhancing clinical protocols to minimize microleakage and improve the longevity and effectiveness of dental restorations. 

CLSM for Polymer and Composite Analysis

CLSM and electron microscopy allows for the examination of the internal structures and interfaces of polymers and composite materials. This application helps testing analysis lab in understanding the dispersion of fillers, phase separation, and the quality of interfaces, which are vital for optimizing the mechanical, thermal, and electrical properties of these materials.

  • Nano Fabrication
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